Displacement ellipsoids are shown at the 50% probability level. 1 Section of the solid-state structure of. Overall, the three hydrogen bonds, together with the three ClF ligands, result in a distorted octahedral coordination sphere for the central F1 anion (Fig. The counterion + forms three short hydrogen bonds to F1 (see Fig. Hence, stronger halide-ligand-interactions result in a more pronounced weakening of the ligand bond. 1 Donation of electron density into this antibonding orbital weakens the corresponding bond. It can be attributed to the interaction between the lone pairs of the central fluoride anion with the σ*(Cl–F) orbital in the ligand. 18 The elongation of the di- or interhalogen ligand bond is well understood in polyhalide chemistry. The Cl–F bond length of neat ClF in the solid-state is 162.8(1) pm. The inverse trend is observed for the Cl–F bond lengths of the ligands: d(Cl1–F2) = 169.9(2) pm, d(Cl2–F3) = d(Cl3–F4) = 168.1(1) pm. Two of the bond lengths to F1 are almost identical ( d(F1-Cl2) = 219.4(2) pm, d(F1–Cl3) = 219.5(1) pm), whereas the bond to the third ClF ligand is approximately 6 pm shorter ( d(F1–Cl1) = 213.9(2) pm). The anion consists of a central fluoride anion F1 coordinated by three ClF molecules in a pyramidal shape. crystallized in the orthorhombic space group Pna2 1, as shown in Fig. We were able to grow single crystals suitable for X-ray diffraction at −80 ☌. Initially, ClF likely oxidizes the chloride anion to yield elemental chlorine and a fluoride anion, which is eventually coordinated by three ClF molecules. It was synthesized via the exposure of tetramethylammonium chloride to an excess of chlorine monofluoride in dichlorofluoromethane at low temperatures ( eqn (1)).

With a formal − anion, it belongs to the non-classical interhalides. Here, we present an unprecedented Cl(I) compound. 16 The Kraus group recently synthesized the first non-classical fluoridochlorate( III), the − anion obtained by solvolysis of CsF in ClF 3. The known fluoridohalides of this group are −, 10 −, 15,16 and −. 10 Non-classical interhalides have more electronegative central halogen atoms surrounded by more electropositive (poly)halogen ligands. 14 The valence shell pair repulsion (VSEPR) model can well predict the linear structures of the − anions and square planar shape of −, but not the undistorted octahedral structures of the − (X = Br, Cl) anions. 1 Classical interhalides have a central, more electropositive halogen atom surrounded by more electronegative halogens.

They can be divided into two conceptually different groups, classical and non-classical interhalides. In the last few decades, several binary fluoridopolyhalogenates were structurally described. Fluoridopolyhalogen chemistry is experiencing a renaissance. Quantum-chemical investigations predict an unexpected planar structure for the − anion. Both salts were obtained from the reaction of the corresponding ammonium chlorides with ClF or Cl 2, respectively. From the capacitance-voltage (C-V)-curves, flat-band voltages are extracted which, when plotted against SiO 2-insulator thickness, yield a work function of 4.72 eV for as-deposited films.We present the synthesis and characterization of the first non-classical Cl( I) polyinterhalide as well as the homologous polychloride. A NbN/SiO 2 /p-Si gate stack is fabricated using the grown niobium nitride films.

The lowest specific resistivities, determined by four point probe measurements, are in the range 500–600 mV cm. Films deposited above 450 8C consist of the cubic d-NbN phase, apart from the presence of Nb-O and Nb-ON species predominantly in the outermost film regions. Films of thicknesses 50-200 nm are deposited at temperatures ranging from 400 8C to 800 8C under reactor pressures of 1 and 5 mbar using various ammonia flow rates, and are characterized by the use of complementary techniques, namely X-ray diffraction (XRD), scanning electron microscopy (SEM), secondary neutral mass spectrometry (SNMS), Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), and electrical measurements. Niobium nitride thin films are deposited on 2 00 silicon (100) wafers using a modified industrial metal-organic (MO) CVD reactor of the type AIX-200RF, starting from tert-butylamido-tris-(diethylamido)-niobium (TBTDEN) and ammonia.

Cl4 ion bonding